‌Programmable to any frequency between 2 and 60 MHz

Ability to store multiple phase offsets for batch processing

Simultaneous and phase continuous frequency changes

Allows adjustment for cable length dependencies

Ability to automate tuning process

All channels can be individually programmed for different frequencies


‌The VF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.


  • Input Voltage: 120VAC, 50/60 Hz

  • Input Current: 1A

  • RF Voltage Output: 500mV RMS minimum, 650mV typical (into 50 Ohms)

  • Frequency Output: 2-60 MHz

  • Control: Local Operation, RS232 Operation


  • Customized choice of up to 16 channels

  • Local Operation or RS232 Operation

  • Higher and lower frequency modules are available